製品情報論文

Fabrication of a high-Q factor ring resonator using LSCVD deposited Si3N4 film

XIAOYANG CHENG,1 JIANXUN HONG,1,2 ANDREW M. SPRING,1 AND SHIYOSHI YOKOYAMA1,3,*

1. Department of Molecular and Material Sciences, Kyushu University
2. School of Information Engineering, Wuhan University of Technology
3. Institute for Materials Chemistry and Engineering, Kyushu University

Vol. 7, No. 7 | 1 Jul 2017 | OPTICAL MATERIALS EXPRESS 2182

Design and fabrication of high-performance diamond triple-gate field-effect transistors

Jiangwei Liu, Hirotaka Ohsato, Xi Wang, Meiyong Liao & Yasuo Koide

Scientific Reports 6, Article number: 34757 (2016) doi:10.1038/srep34757

Planar Indium Tin Oxide Heater for Improved Thermal Distribution for Metal Oxide Micromachined Gas Sensors

M. Cihan Çakır 1,2,*, Deniz Çalışkan 1, Bayram Bütün 1 and Ekmel Özbay 1,3
1 Nanotechnology Research Center, Bilkent University, Ankara 06800, Turkey
2 Department of Nanotechnology and Nanomedicine, Hacettepe University, Ankara 06800, Turkey

Sensors 2016, 16(10), 1612; doi:10.3390/s16101612

UV/ozone Surface Modification for Long-term Stable Hydrophilic Surface of Polymer Microfluidic Devices

Shogo Uehara, Tsukasa Kawabe, Peter Wood and Osamu Tsuji

MRS Advances, 1, pp 743-748. doi:10.1557/adv.2016.167.

A self-aligned gate GaN MOSFET using an ICP-assisted low-temperature Ohmic process

Qingpeng Wang1,2, Ying Jiang1,2, Jiaqi Zhang1,2, Kazuya Kawaharada1, Liuan Li1, Dejun Wang2 and Jin-Ping Ao1
1 Institute of Technology and Science, the University of Tokushima, Japan
2 Dalian University of Technology, People’s Republic of China

Semicond. Sci. Technol. (2015) 30 075003

A CMOS-Compatible Fabrication Process for Scaled Self-Aligned InGaAs MOSFETs

Jianqiang Lin, Dimitri A. Antoniadis, and Jesús A. del Alamo

CS MANTECH Conference, May 18th - 21st, 2015, Scottsdale, Arizona, USA pp. 239-242.

Optimizing the SiC Plasma Etching Process For Manufacturing Power Devices

H. Oda, P. Wood, H. Ogiya, S. Miyoshi and O. Tsuji

CS MANTECH Conference, May 18th - 21st, 2015, Scottsdale, Arizona, USA

Performance of SU-8 Membrane Suitable for Deep X-Ray Grayscale Lithography

Harutaka Mekaru / Research Center for Ubiquitous MEMS and Micro Engineering (UMEMSME), National Institute of Advanced Industrial Science and Technology (AIST)

Micromachines 2015, 6(2), 252-265; doi:10.3390/mi6020252

Fabrication and Characterization of a Novel Nanoscale Thermal Anemometry Probe

Margit Vallikivi and Alexander J. Smits / Department of Mechanical and Aerospace Engineering, Princeton University, Princeton, NJ 08544 USA

Journal of Microelectromechanical Systems (2014) 23 , 4

Recess Etching Process for AlGaN/GaN-HFET Devices Using In-Situ Monitoring

T. Nishimiya, H. Ogiya, M. Hiramoto, S. Motoyama and P. Wood

CS MANTECH Conference, May 19th – 22nd, 2014, Denver, Colorado, USA