Inductively Coupled Plasma Etching Systems

Samco delivers many dedicated Inductively Coupled Plasma (ICP) etching system in research and production to meet each customer's process requirements for high-density plasma etching. Our reliable, durable and compact ICP etching system allows you to handle a variety of materials (III-V compound semiconductors (GaN, GaAs, InP), silicon, SiC, quartz, glass, dielectrics, and metals.).

Key Features and Benefits

Benefits of Samco's ICP Etching systems

  • High etch rates
  • Excellent uniformity
  • Excellent substrate DC bias and ion energy control
  • Precise wafer temperature control from -10ºC to +200ºC by ESC
  • Extensive process library

Cutting-edge technology such as MicroLEDs, laser diode, SiC power devices, GaN RF devices, SAW / BAW filters, capacitors and MEMS devices are getting more expectation to create the next decade. Microfabrication of compound semiconductor, which is the material of such devices, requires highly accurate dry plasma etching processes. Samco's advanced inductively coupled plasma (ICP) etching systems are well-versed to the processing of compound semiconductor devices. ICP etching systems achieve a plasma density of 1000 times as high as that of conventional capacitive coupled plasma reactive ion etching (CCP-RIE) systems. They are capable of a broader range of processes. However, it isn't easy to obtain uniform plasma in ICP etching systems. Samco developed the Tornado ICP™, the ICP coil with three-dimensional structures which enables the formation of highly uniform plasma.

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(a) Coutour Line of Electric Field by Tornado ICP™

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(b) Magnetic Field by Tornado ICP™

Samco conducted electromagnetic field simulations to improve the reliability and performance of the Tornado ICP™. With these simulations, we figured out the optimum configuration for the best uniformity. Tornado ICP™ etching systems achieved highly uniform, high-speed, high-aspect-ratio etching not only on compound semiconductors but also on silicon and metal thin films and are used in many factories and research laboratories in various industries.