ProductsPlasma Cleaner PC-2000

The PC-2000 is the latest model in Samco's parallel-plate batch plasma cleaner series, an industry-proven platform with an installation base exceeding 500 units. This system is engineered for high-precision cleaning, ashing, and surface modification processes such as hydrophilization, serving a wide range of sectors including semiconductor packaging, wafer fabrication, optics, and biotechnology. By providing two processing modes — Plasma Etching (PE) and Reactive Ion Etching (RIE)— the equipment facilitates optimized processes tailored to specific substrate characteristics and technical requirements. The reaction chamber is equipped with multiple electrode shelves, allowing for the simultaneous high-volume processing of diverse substrates ranging from miniature components to large-scale substrates up to 400 mm square. Additionally, integrated recipe and user management functionalities ensure operational consistency, supporting applications from laboratory research to industrial production

• Selectable process modes (PE, RIE) for optimized, application-specific processing
• Flexible shelf electrode for processing a wide range of sample types in PE and RIE modes
• Chamber liner and O-ring seals for easy cleaning and maintenance
• RF power up to 900 W for enhanced processing performance and throughput
• 10.4-inch touchscreen interface for intuitive operation
• Vdc, Vpp, matching position display, and event logging functions for process monitoring
• Integrated dry pump for reduced system footprint

• Cleaning and surface modification of plastic packages such as BGA and CSP, and lead frames
• Hydrophilization of optical components and molds
• Photoresist ashing, stripping, and descumming
• DLC film stripping for mold refurbishment
• Surface modification and hydrophilization of microfluidics, cell culture dishes, and more

• Allows for up to 3-stage processing with the addition of extra electrode shelves
• PC-based data logging capability
• Slow exhaust/Slow vent valve