ProductsCCP-RIE System RIE-10NR

The Samco RIE-10NR is a fully automatic, open-load Reactive Ion Etching (RIE) system engineered for non-corrosive gas chemistry applications. Designed with an active installed base of over 700 units, the system features a reaction chamber with a proprietary gas distribution mechanism and a four-way symmetrical exhaust configuration, delivering superior etch uniformity and run-to-run repeatability across diverse material platforms.

• Single-wafer processing up to ø8-inch (ø200 mm) wafers and high-throughput batch processing for small-diameter wafers
• Four-way exhaust system establishes a symmetrical gas flow for superior film uniformity
• Space-saving architecture delivers a compact cleanroom footprint
• Comprehensive interlocks and fault detection systems ensure safe system operation
• Touch-panel interface enables automated operation and recipe management (up to 100 recipes, 10 steps each)

• Selective etching of SiO2 and SiN for failure analysis
• SiO2 hard mask etching for compound semiconductor devices
• Silicon (Si) etching
• Metal patterning (e.g., Pt, Mo) for sensor fabrication
• Etching of organic materials and resins
• Descumming and photoresist ashing

• Stainless steel (SUS) chamber liner
• Adjustable electrode gap configuration
• Optical emission spectroscopy (OES) endpoint monitor
• Anode/cathode switching function