1. 1979

    September
    Established Samco International, Inc. for the purpose of manufacturing and selling semiconductor production equipment.

  2. 1980

    July
    Commenced the development and sales of large-scale CVD (Chemical Vapor Deposition) systems for semiconductor processing.

  3. 1981年

    April
    Commenced the development and sale of the first domestically produced MOCVD system for compound semiconductor manufacturing.

  4. 1984

    July
    Tokyo Sales Office (now the East Japan Sales Department) was established in Shinagawa-ku, Tokyo.

  5. 1985

    June
    The company headquarters was relocated to 33 Takeda Tanaka Miyacho (currently 36 Warayacho), Fushimi-ku, Kyoto.
    June
    Commenced sales of products from March Instruments, Inc. (now Nordson Corporation).

  6. 1987

    February
    Established the Optofilms Research Laboratory in California, USA

  7. 1990

    November
    Commenced the development and sales of CVD equipment for high-speed film formation utilizing liquid sources.

  8. 1991

    March
    The R&D Center was established in Fushimi-ku, Kyoto.

  9. 1993

    February
    Established the Tsukuba Branch (now the Tsukuba Sales Office) in Tsuchiura City, Ibaraki Prefecture.
    September
    The Tokai Sales Office was established in Nagakute, Aichi District, Aichi Prefecture (currently Nagakute City). It has since been elevated to the Tokai Branch and was relocated to Nagoya in January 2020.

  10. 1994

    February
    Commenced the manufacture and sale of ferroelectric thin-film deposition systems utilizing technology from Symetrix Corporation of the United States.

  11. 1995

    July
    Developed fundamental thin-film technology for the neutralization of specific chlorofluorocarbons.
    December
    Commenced the development and sales of the RIE-10NR, a compact, multipurpose plasma etching system.

  12. 1996

    December
    Launched the development and sales of the RIE-101iP, a high-density plasma ICP etching system.

  13. 1997

    November
    In collaboration with Kirin Brewery Co., Ltd., we developed technology for applying Diamond-Like Carbon (DLC) coatings to plastic bottles.
    November
    Launched the development and sales of the RIE-200iP, a compact, high-density Inductively Coupled Plasma (ICP) etching system.

  14. 1998

    March
    The Hiroshima Sales Office was established in Asa-minami-ku, Hiroshima City (subsequently closed in September 2014).
    December
    Launched the development and sales of the PD-220, a compact, versatile plasma CVD system.

  15. 1999

    July
    Acquired service division operations from Samco Engineering Co., Ltd.

  16. 2000

    January
    Established a research laboratory at the University of Cambridge in the United Kingdom.

  17. 2001

    May
    Shares were listed on the over-the-counter market of the Japan Securities Dealers Association (JSDA).
    July
    Established a Taiwan office in Hsinchu City, Taiwan (closed in January 2009).
    October
    Established the Sendai Sales Office in Aoba-ku, Sendai (closed in December 2014).

  18. 2002

    July
    Completed the renovation of the Production Technology Research Building in Fushimi-ku, Kyoto.

  19. 2003

    November
    Commenced development and sales of the PD-220LC plasma CVD system for mass production.
    December
    Licensing of high-speed silicon deep etching technology from Robert Bosch GmbH.

  20. 2004

    November
    Established the Shanghai office in Shanghai, China.
    December
    Samco International, Inc. changed its corporate name to Samco Inc.
    December
    The trading unit for shares was transitioned from 1,000 to 100 units.
    December
    Withdrew from JSDA Over-the-Counter Trading Securites Market and became publicly listed in JASDAQ Securities Exchange Market

  21. 2005

    February
    Established the Production Equipment Division, currently known as the Product Technology Department.
    May
    Launched the development and commercial release of the PD-2203L Cluster Lab, an advanced plasma-enhanced chemical vapor deposition (PECVD) system engineered for versatile research and pilot-scale applications.
    September
    Licensed mass production technology for ferroelectric nanotubes, developed in collaboration with the University of Cambridge, to a British enterprise.
    December
    Commenced the development and sales of the PC-300, a compact batch-type plasma processing system designed for cleaning electronic substrates.

  22. 2006

    March
    Established the Product Service Center.
    May
    Commenced the development and sales of the RIE-800iPB, a dry etching system designed for MEMS applications.
    September
    Signed an agreement for joint research on nanofabrication technology with Tsinghua University in China.

  23. 2007

    November
    Launched the RIE-140iP/iPC, an advanced dry etching system specifically engineered for the high-precision manufacturing of semiconductor lasers.

  24. 2008

    March
    Established the Second R&D Center in Fushimi-ku, Kyoto.
    May
    Launched the development and sale of the MCV-2018, a mass-production MOCVD system designed for gallium nitride thin-film deposition.
    October
    Established Samco Global Service Inc. in Taiwan as a local subsidiary to provide maintenance services.
    November
    Commenced the development and sales of the RIE-330iP/iPC, a dry etching system specifically designed for gallium nitride (GaN) wafers.

  25. 2009

    January
    Started running of Samco Global Service Inc.
    April
    Ceremony was held at the Kyoto Hotel Okura to commemorate and express gratitude for the 30th anniversary of our founding.
    October
    Launched the development and sales of the RIE-400iPB, a dry etching system designed for MEMS research and development.

  26. 2010

    April
    Following the merger of the JASDAQ Securities Exchange and the Osaka Securities Exchange, the company was listed on the JASDAQ market of the Osaka Securities Exchange (known as Tokyo Stock Exchange JASDAQ Standard since July 2013).
    July
    Commenced the development and sales of the PD-330STC, a plasma CVD system designed for TSV mass production.
    July
    Commenced development and sales of the PD-5400, a high-volume plasma-enhanced chemical vapor deposition (PECVD) system specifically engineered for LED manufacturing.
    August
    Established the U.S. East Coast Office in North Carolina (relocated to New York in May 2014 and to New Jersey in January 2017).
    September
    Established the Beijing Office in Beijing, China.

  27. 2011

    December
    Commenced the development and sales of the RIE-331iPC etching system, specifically engineered for the Asian market.

  28. 2012

    May
    Established Vietnam Service Office in Ho Chi Minh City, Vietnam.
    November
    Commenced development and sales of the RIE-600iP, a dry etching system engineered for SiC power devices.

  29. 2013

    July
    Following the merger of the Tokyo Stock Exchange and the Osaka Securities Exchange, the company was listed on the Tokyo Stock Exchange JASDAQ (Standard) and subsequently transitioned to the Second Section of the Tokyo Stock Exchange.
    October
    Commenced the development and sales of the RIE-600iPC, a dry etching system designed for the full-scale mass production of SiC power devices.
    November
    Commenced the development and sales of the RIE-800iPBC, a high-volume production dry etching system engineered for MEMS applications.

  30. 2014

    January
    Listed on the First Section of the Tokyo Stock Exchange.
    March
    Entered into an exclusive distribution agreement with Valence Process Equipment Inc. of the United States for MOCVD systems.
    May
    Acquired a 90% stake in UCP Processing Ltd., based in the Principality of Liechtenstein, and established it as a subsidiary, subsequently renaming it samco-ucp AG.
    September
    Established the Fukuoka Sales Office in Chuo-ku, Fukuoka (closed in September 2021).

  31. 2015

    September
    The capital was increased to 1,663.68 million yen through a public offering.
    December
    Entered into a distributorship agreement with Epiluvac AB of Sweden for SiC epitaxial growth systems and commenced the development and sales of the AL-1 atomic layer deposition system for electronic devices.

  32. 2016

    June
    Completion of the Second Manufacturing Technology Building (Fushimi-ku, Kyoto).
    August
    Established the Malaysia Office in Malaysia.
    September
    Commenced the development and sales of the AQ-2000 plasma cleaning system featuring Aqua Plasma® technology.

  33. 2019

    September
    Commemorated our 40th anniversary with a celebration of gratitude held at the Kyoto Hotel Okura.

  34. 2020

    July
    Established a state-of-the-art CVD equipment demonstration facility within our Second Manufacturing Technology Building.

  35. 2021

    March
    Successfully developed advanced technology for the inactivation of SARS-CoV-2.
    December
    Commenced the development and sales of Cluster H™, a cluster tool system designed for electronic device manufacturing.

  36. 2022

    March
    The Nano Thin Film Development Center was established within the Second R&D Building.
    April
    Following the revision of the Tokyo Stock Exchange's market segments, the company transitioned from the First Section to the Prime Market.
    October
    Commenced development and sales of the AD-800LP, a plasma ALD system designed for advanced research and development.

  37. 2023

    October
    Commenced the development and sales of the PD-2203LC multi-chamber plasma CVD system.
    November
    Established a strategic partnership with the Eastern Switzerland University of Applied Sciences and commenced sales operations to expand our presence in the European market.

  38. 2024

    May
    Commenced construction of the Advanced Technology Development Center.

  39. 2025

    September
    Completion of the Advanced Technology Development Center (Fushimi-ku, Kyoto)
    December
    Commenced the development and commercialization of ALE systems, enabling precision processing at the atomic layer level.

  40. 2026

    March
    Commenced the development and sales of the AD-8002LPC, a dual-chamber ALD system.