for imprint mold

Processing of quartz glass in line and space patterns with a width of 5 μm using the RIE-400iPB, a research and development device. The selection ratio to the Cr mask is about 100:1, with a depth of 6 μm and a forward taper because the Cr mask was pushed back during processing.

Photo courtesy of Yamagata research institute of technology

Request more information

Products

RIE-400iPB