UV Ozone Cleaner UV-300
Rotating stage ensure uniformity
Description
The UV-300 is a compact benchtop UV ozone cleaner. The rotating stage ensures high uniformity of the cleaning rate across the substrate surfaces. This system uses a unique combination of ultraviolet irradiation, ozone, and stage heating to gently, yet effectively, remove organic materials from a variety of substrates, including silicon, glass, compound semiconductors (GaN, SiC, GaAs, and InP), sapphire, ceramics, etc.
Key Features and Benefits
- Processing up to ø300 mm (ø12 inch）
- Rotating stage ensures high uniformity of cleaning rate across the substrate surfaces
- Heating stage accelerates the cleaning rates and realizes a broad process temperature range
- Compact, uses minimum benchtop space
- Easy, operates at atmospheric pressure - no vacuum system required
- Soft, completely dry process will not cause electrical damage to substrates
- Lid interlock guarantees that the system is inoperable when the lid is open
- Built-in ozone catalyst unit for reducing ozone concentration in the exhaust to a safe level
- Safety features include lid interlocks, automatic purge cycle, overtemperature interlock, ozone scrubber, and emergency stop switch.
Applications
- Surface cleaning of compound semiconductor (GaN, SiC, GaAs, and InP)
- Surface modification (wettability and adhesion improvement)
- Surface oxidation (thin oxidized layer deposition)
- Photoresist ashing, stripping, and descuming
- Removal of organic contaminants
- UV curing
