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High-aspect-ratio (80:1) Deep Etching
Deep silicon etching via …
Product
RIE-800iPB
ø30 nm Si Pillar Etching
control of sub-100 nm sil…
RIE-400iPB
ø70 nm Si Hole Etching
sub-100 nm high-aspect-ra…
450 µm Depth Pillar
silicon etching system RI…