On September 1, 2025, Samco Inc.'s Chairman and CEO, Osamu Tsuji, delivered an invited lecture at the Indian Institute of Technology Delhi (IIT Delhi).
Entitled "4 Decades of Plasma CVD & ALD," the lecture was presented to students and faculty of the School of Engineering and the School of Energy Science and Engineering. Tsuji traced the 40-year evolution of Plasma CVD (Chemical Vapor Deposition) and ALD (Atomic Layer Deposition), highlighting the latest research trends, industrial applications, and future possibilities. He also introduced the advantages of Samco's thin film formation technologies, which prompted a lively Q&A session with participants.
This lecture was made possible through Samco's ongoing collaborations with leading Indian research institutions. India is a vital partner in the future semiconductor industry, and IIT Delhi is recognized as one of Asia's foremost centers for science and engineering research.
During his talk, Tsuji remarked:
"It is Samco's mission to collaborate with universities and research institutions worldwide to create next-generation technologies. I am deeply honored that this lecture provides an opportunity to co-create the future with India's young researchers and students."
Samco remains committed to strengthening its ties with the global research community, including India, and advancing technological innovation in the semiconductor and energy fields to contribute to a sustainable society.
