ProductsUV Ozone Cleaner UV-300HC

The UV-300HC is a cassette-loading UV ozone cleaner designed for high-throughput production, utilizing two atmospheric cassettes and ashing rates of 10–100 nm/min. It enables electrical damage-free surface preparation prior to the epitaxial growth and photolithography of compound semiconductors (such as InP, GaAs, GaN, and SiC). This system uses a unique combination of ultraviolet irradiation, high-concentration ozone, and controlled stage heating to gently, yet effectively, remove organic contaminants and defect sources from a variety of substrates, including silicon, glass, compound semiconductors, sapphire, ceramics, and more.

• Processing up to ø240 mm (ø3" x 5, ø4" x 3, ø8" x 1)
• Ashing rates of 10-100 nm/min
• Heating stage accelerates cleaning rates and supports a wide process temperature range
• Soft, dry, damage-free process without electrical damage (no ion or electron bombardment)
• Integrated catalytic ozone decomposer unit eliminates need for external ozone treatment equipment
• Compact footprint minimizes cleanroom space requirements
• Easy, atmospheric pressure operation–no vacuum system required
• Built to UL standards

• Pre-epitaxy surface cleaning of compound semiconductors (GaN, GaAs, InP, and SiC)
• Pre-lithography surface treatment (HMDS anchoring for photoresist adhesion improvement)
• Photoresist ashing and descumming
• Surface oxidation (thin oxide layer formation)