ProductsUV Ozone Cleaner UV-300H

The UV-300H is a high performance and compact UV ozone cleaner. Substrates are loaded into the system through a sliding drawer. This system uses a unique combination of ultraviolet irradiation, high concentration of ozone, and stage heating to gently, yet effectively, remove organic materials from a variety of substrates, including silicon, glass, compound semiconductors (GaN, SiC, GaAs, and InP), sapphire, ceramics, etc.

• Ashing rates of 10-100 nm/min
• Heating stage accelerates cleaning rates and supports a wide process temperature range
• Soft, dry, damage-free process without electrical damage (no ion or electron bombardment)
• Compact footprint minimizes cleanroom space requirements
• Easy, atmospheric pressure operation–no vacuum system required

• Pre-epitaxy surface cleaning of compound semiconductors (GaN, GaAs, InP, and SiC)
• Pre-lithography surface treatment (HMDS anchoring for photoresist adhesion improvement)
• Photoresist ashing and descumming
• Surface oxidation (thin oxide layer formation)