ALD System AD-10P
Open Load PE- and Thermal ALD System
Description
The Samco AD-10P is a compact, open-load Atomic Layer Deposition (ALD) system built for high-precision thin-film coating across R&D institutes, universities, and semiconductor device manufacturing facilities. Capable of seamlessly integrating both Thermal ALD and Plasma-Enhanced ALD (PEALD), the system enables atomic-level thickness control, superior step coverage, and pinhole-free films across diverse substrates.Flexible substrate options support up to one 8-inch wafer or three 4-inch wafers simultaneously via carrier tray, making the AD-10P an ideal bridge from fundamental material research to preliminary process development.
Key Features and Benefits
- Sub-Hundred-Millisecond Pulsed Injection: Precision high-speed valving delivers precursor exposure down to tens of milliseconds, drastically reducing chemical loss and accelerating overall ALD cycle efficiency.
- Integrated Inner-Wall Thermal Control: Closely fitted inner-wall heaters eliminate internal temperature gradients, preventing localized precursor condensation and byproduct buildup.
- Cross-Contamination-Free Internal Architecture: Optimized gas pathway routing suppresses premature chemical mixing, directly preventing particle generation and ensuring dense, pinhole-free film growth.
Applications
- Gate Dielectrics & Passivation for Next-Generation Power Devices: Precise deposition of high-κ gate oxides (Al2O3, SiO2, HfO2) and stable surface passivation layers for high-voltage GaN and SiC HEMTs/MOSFETs.
- Conformal Coating on 3D MEMS & High-Aspect-Ratio Topologies: Self-limiting surface reactions deliver 100% uniform film coverage inside deep trenches, micro-channels, and complex three-dimensional MEMS structures.
- Semiconductor Laser Facet Coatings: Low-damage, precise dielectric deposition on semiconductor laser cavity facets for controlled reflectivity and catastrophic optical damage (COD) prevention.
- Protective Encapsulation for Carbon Nanotubes (CNTs): Uniform, low-temperature passivation coatings that protect delicate carbon nanotubes without disrupting their physical or electrical properties.




