SEMICON West 2026 is a leading semiconductor manufacturing exhibition in North America, bringing together device manufacturers, equipment suppliers, and R&D professionals across the global microelectronics supply chain.
At this event, Samco Inc. will focus on advanced plasma-based process solutions for the U.S. market, with particular emphasis on Atomic Layer Etching (ALE) and Deep Reactive Ion Etching (DRIE), as well as complementary deposition and cleaning technologies. Samco Inc. will present process concepts and system capabilities that support next-generation semiconductor devices, MEMS fabrication, and advanced materials research.
DRIE for MEMS and microfabrication: High-aspect-ratio silicon etching solutions for MEMS, sensors, and complex microstructures requiring vertical profiles.
Integrated process solutions: Deposition, etching, and cleaning technologies supporting complete process flows from research to pilot development.
Technical consultations: Direct discussions with Samco Inc.’s engineers on process development, equipment configuration, and U.S. market requirements.
Products
Atomic Layer Etching (ALE) Systems – Precision etching platforms enabling atomic-level material removal for next-generation semiconductor devices and advanced research, supporting tight process control and low plasma damage.
DRIE Systems – Deep Reactive Ion Etching platforms designed for high-aspect-ratio silicon etching, widely used in MEMS, sensors, and advanced microfabrication.
Plasma CVD Systems – Plasma-enhanced chemical vapor deposition systems for forming high-quality thin films, suitable for semiconductor, MEMS, and materials research applications.
ALD Systems – Atomic Layer Deposition equipment enabling highly conformal and thickness-controlled film formation for advanced device structures and research environments.
Aqua Plasma® Cleaner – Environmentally friendly plasma cleaning systems using water-based processes for effective surface treatment and contamination removal.
