UV Ozone Cleaner UV-1
Compact benchtop system

Description

The UV-1 is a compact benchtop UV ozone cleaner. This system uses a unique combination of ultraviolet irradiation, ozone, and stage heating to gently, yet effectively, remove organic materials from a variety of substrates, including silicon, glass, compound semiconductors (GaN, GaAs, InP, and SiC), sapphire, ceramics, etc.

Key Features and Benefits

  • Processing up to ø100 mm (4 inch)
  • Heating stage accelerates the cleaning rates and realizes a broad process temperature range
  • Compact, uses minimum benchtop space
  • Easy, operates at atmospheric pressure - no vacuum system required
  • Soft, completely dry process will not cause electrical damage to substrates
  • Lid interlock guarantees that the system is inoperable when the lid is open
  • Ozone catalyst unit for reducing ozone concentration in the exhaust to a safe level
  • Safety features automatic N₂ purge cycle, heated stage fuse protection, ozone scrubber, and emergency stop switch.

Applications

  • Surface cleaning of plastic packages and lead-frames
  • Surface cleaning of compound semiconductor (GaN, GaAs, InP, and SiC)
  • Surface modification (wettability and adhesion improvement)
  • Surface oxidation (thin oxidized layer deposition)
  • Photoresist ashing, stripping, and descuming
  • Removal of organic contaminants
  • UV curing