UV Ozone Cleaner UV-1
Compact benchtop system
Description
The UV-1 is a compact benchtop UV ozone cleaner. This system uses a unique combination of ultraviolet irradiation, ozone, and stage heating to gently, yet effectively, remove organic materials from a variety of substrates, including silicon, glass, compound semiconductors (GaN, GaAs, InP, and SiC), sapphire, ceramics, etc.
Key Features and Benefits
- Processing up to ø100 mm (4 inch)
- Heating stage accelerates the cleaning rates and realizes a broad process temperature range
- Compact, uses minimum benchtop space
- Easy, operates at atmospheric pressure - no vacuum system required
- Soft, completely dry process will not cause electrical damage to substrates
- Lid interlock guarantees that the system is inoperable when the lid is open
- Ozone catalyst unit for reducing ozone concentration in the exhaust to a safe level
- Safety features automatic N₂ purge cycle, heated stage fuse protection, ozone scrubber, and emergency stop switch.
Applications
- Surface cleaning of plastic packages and lead-frames
- Surface cleaning of compound semiconductor (GaN, GaAs, InP, and SiC)
- Surface modification (wettability and adhesion improvement)
- Surface oxidation (thin oxidized layer deposition)
- Photoresist ashing, stripping, and descuming
- Removal of organic contaminants
- UV curing